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Recent Journal Papers:

• S.-Y. Lee, “Effects of Lithographic and Pattern Parameters on Stability of Feature-Edge Location in Electron-beam Lithography," Journal of Vac. Sci. and Technol., B 42(6), 062604, Nov/Dec 2024.
• S.-Y. Lee, “Analytic Study of Exposure Contrast over Feature Edge in Electron-beam Lithography," Journal of Vac. Sci. and Technol., B 41(6), 062606, Nov/Dec 2023.
• S.-Y. Lee and M. N. Hasan, “Generalized Performance Optimization Massively-Parallel Electron-beam Systems," Journal of Vac. Sci. and Technol., B 41(4), 042603, Jul/Aug 2023.
• M. N. Hasan, S.-Y. Lee, B.-S. Ahn, J. Choi, and J.-S. Park, “Reduction of Exposing Time in Massively-Parallel Electron-beam Systems," Journal of Vac. Sci. and Technol., B 40(3), 032602, Nov/Dec 2022.
• D. Li, S.-Y. Lee, J. Choi, S.-B. Kim, and C.-U. Jeon, “Estimation of Critical Dimension and Line Edge Roughtness using a Neural Network," Journal of Vac. Sci. and Technol., B 39(3), 032602, May/Jun 2021.
• D. Li, S.-Y. Lee, J. Choi, S.-B. Kim, and C.-U. Jeon, “3D Modeling of Electron-beam Lithographic Process from Scanning Electron Microscope Images," Journal of Vac. Sci. and Technol., B 39(1), 012603, Jan/Feb 2021.
• M. N. Hasan, S.-Y. Lee, B.-S. Ahn, J. Choi, and J.-S. Park, “Effectiveness of Multipass and Multirow Writing Methods for Massively-Parallel Electron-beam Systems," Journal of Vac. Sci. and Technol., B 38(6), 062601, Nov/Dec 2020.
• M. N. Hasan, S.-Y. Lee, B.-S. Ahn, J. Choi, and J.-S. Park, “Shape and Dose Control for Proximity Effect Correction on Massively-Parallel Electron-beam Systems," Journal of Vac. Sci. and Technol., B 38(6), 062603, Nov/Dec 2020.
• M. N. Hasan, S.-Y. Lee, B.-S. Ahn, J. Choi, S.B. Kim, and C.U. Jeon, “Effects of Abnormal Beams on Writing Qualities in Massively-Parallel Electron-Beam Systems," Journal of Vac. Sci. and Technol., B 37(6), 061609, Nov/Dec 2019.
• S.-Y. Lee, B.-S. Ahn, J. Choi, S.B. Kim, and C.U. Jeon, “Multirow Writing Method for Massively-Parallel Electron-Beam Systems," Journal of Vac. Sci. and Technol., B 37(6), 061602, Nov/Dec 2019.
• H. Ji and S.-Y. Lee, “Designing an Annisotropic Noise Filter for Measuring Critical Dimension and Line Edge Roughness from Scanning Electron Microscope Images," Journal of Vac. Sci. and Technol., B 36(6), 06JA06, Nov/Dec 2018.
• S.-M. Moon, S.-Y. Lee, J. Choi, S.-B. Kim, I.-K. Shin, and C.-U. Jeon, “Effects of Lithographic Parameters in Massivley-parallel Electron-beam Systems," Journal of Vac. Sci. and Technol., B 36(6), 06JA03, Nov/Dec 2018.
• H. Ji, S.-Y. Lee, J. Choi, S.-H. Park, S.-B. Kim, I.-K. Shin, and C.-U. Jeon, “Effects of Stochastic Exposure on Critical Dimension in Electron-beam Lithography," Journal of Vac. Sci. and Technol., B 35(6), 06G503, Nov/Dec 2017.
• D. Li, R. Guo, S.-Y. Lee, J. Choi, S.-H. Park, S.-B. Kim, I.-K. Shin, and C.-U. Jeon, “Noise Filtering for Accurate Measurement of Line Edge Roughness and Critical Dimension from SEM Images," Journal of Vac. Sci. and Technol., B 34(6), 06K604, Nov/Dec 2016.
• R. Guo, S.-Y. Lee, J. Choi, S.-H. Park, S.-B. Kim, I.-K. Shin, and C.-U. Jeon, “Analytic Estimation of Line Edge Roughness for Large-scale Uniform Patterns in Electron-beam Lithography," Journal of Vac. Sci. and Technol., B 34(6), 60K605, Nov/Dec 2016.
• R. Guo, S.-Y. Lee, J. Choi, S.-H. Park, I.-K. Shin, and C.-U. Jeon, “A Practical Approach to Modeling Scanning Electron Microscope Images for Minimization of Line Edge Roughness and Critical Dimension Error," Journal of Vac. Sci. and Technol., B 34(1), 011601, Jan/Feb 2016.
• R. Guo, S.-Y. Lee, J. Choi, S.-H. Park, I.-K. Shin, and C.-U. Jeon, “Analytic Derivation and Minimization of Line Edge Roughness in Electron-beam Lithography," Journal of Vac. Sci. and Technol., B 33(6), 06FD07-1, Nov/Dec 2015.
• Q. Dai, R. Guo, S.-Y. Lee, J. Choi, S.-H. Lee, I.-K. Shin, B.-G. Kim, C.-U. Jeon and H.-K. Cho, “A Fast Path-based Method for 3-D Resist Development Simulation in Electron-beam Lithography,” Microelectronic Engineering, 127, 86-96, 2014.
• X. Zhao, S.-Y. Lee, J. Choi, S.-H. Lee, I.-K. Shin and C.-U. Jeon, “Minimization of Line Edge Roughness and CD Error in Electron-beam Lithography," Journal of Vacuum Science and Technology. B32, 06F505, 2014.
• X. Zhao, Q. Dai, S.-Y. Lee, J. Choi, S.-H. Lee, I.-K. Shin and C.-U. Jeon, “Determination and Analysis of Minimal Dose for Achieving Vertical Sidewall in Electron-beam Lithography," Journal of Vacuum Science and Technology, B32, 06F508, 2014.
• S.-Y. Lee, J. Choi, S.-H. Lee, I.-K. Shin, C.-U. Jeon, and S.-C. Jeon “Experimental Verification of Achieving Vertical Sidewall for Nanoscale Features in Electron-beam Lithography," Journal of Vacuum Science and Technology. B32, 06F510, 2014.
• R. Guo, S.-Y. Lee, J. Choi, S.-H. Lee, I.-K. Shin, C.-U. Jeon, B.-G. Kim, and H.-K. Cho, "Derivation of Line Edge Roughness based on Analytic Model of Stochastic Exposure Distribution," J. Vac. Sci & Technol., B31(6), 06F-408, Nov/Dec, 2013.
• X. Zhao, S.-Y. Lee, S.-H. Lee, B.-G. Kim, and H.-K. Cho, "Fast Simulation of Stochastic Exposure Distribution for LER Study," J. Vac. Sci & Technol., B30(6), 06F-308, Nov/Dec, 2012.
• Q. Dai, S.-Y. Lee, S.-H. Lee, B.-G. Kim, and H.-K. Cho, "New Types of Dose Distributions for Vertical Sidewall Minimizing Total Dose in Electron-beam Proximity Effect Correction of Nanoscale Features," J. Vac. Sci & Technol., B30(6), 06F-307, Nov/Dec, 2012.
• Q. Dai, S.-Y. Lee, S.-H. Lee, B.-G. Kim, and H.-K. Cho, "Experiment-based Estimation of Point Spread Function in Electron-beam Lithography," Microelectronic Engineering, 88(10), pp.3054-3061, 2011.
• Q. Dai, S.-Y. Lee, S.-H. Lee, B.-G. Kim, and H.-K. Cho, "Estimation of Resist Profile for Line/Space Patterns using Layer-based Exposure Modeling," Microelectronic Engineering, 88(6), pp.902-908, 2011.
• Q. Dai, S.-Y. Lee, S.-H. Lee, B.-G. Kim, and H.-K. Cho, "Three-dimensional Proximity Effect Correction for Large-scale Uniform Patterns," J. Vac. Sci & Technol., B29(6), 06F-314, Nov/Dec, 2011.
• D. Liu, S. Morshed, B. Zhou, B. Prorok, and S.-Y. Lee, "Fabrication of Polynomial 3-D Nanostructures in Si with a Single_Step Process," J. of Micro-Nanolithography, MEMS andMOEMS (JM3), 10(1), 010501, 2011.
• S.-Y. Lee, Q. Dai, S.-H. Lee, B.-G. Kim, and H.-K. Cho, "Enhancement of Spatial Resolution in Generating Point Spread Function by Monte Carlo Simulation in Electron-beam Lithography," J. Vac. Sci & Technol., B29(6), 06F-902, Nov/Dec, 2011.
• Nak H. Kim and S.-Y. Lee, "Vision-based Approach to Automated Analysis of Structure Boundaries in Scanning Electron Microscope Images," J. Vac. Sci & Technol., B29(1), Jan/Feb, 2011.
• P. Li, S.-Y. Lee, S. C. Jeon, J. S. Kim, K. N. Kim, M. S. Hyun, J. J. Yoo, and J. W. Kim, "Step Width Adjustment in Fabrication of Staircase Structures," J. Vac. Sci & Technol., B28(1), pp.30-35, Jan/Feb, 2010.
• S.-Y. Lee, S. C. Jeon, J. S. Kim, K. N. Kim, M. S. Hyun, J. J. Yoo, and J. W. Kim, "Spatial Dose Control for Fabrication of Saw-tooth Structures,” J. Vac. Sci & Technol., B27(6), pp.2580-2584, Nov/Dec, 2009.
• C. Guo, S.-Y. Lee, S. H. Lee, B.-G. Kim and H.-K. Cho, "Application of Neural Network to E-beam Dose Control for 3-D Proximity Effect Correction," J. Vac. Sci & Technol., B27(06), pp.2572-2579, Nov/Dec, 2009.
• S.-Y. Lee and Kasi Anbumony, "Accurate Control of Remaining Resist Depth for Nanoscale 3-D Structures in E-beam Grayscale Lithograpphy," J. Vac. Sci. Technol., B25(6), pp.2008-2012, Nov/Dec 2007
• J. Kim, K. Jalhadi, S.-Y. Lee and D. Joy, "Fabrication of a Fresnel Zone Plate through E-beam Lithographic Process and its Application to Measuring of CD-SEM Performance," J. Vac. Sci. Technol., B22(6), pp.1771-1775, Nov/Dec 2007
• J. Kim, D.C. Joy and S.-Y. Lee, "Controlling resist thickness and etch depth for fabrication of 3D structures in electron-beam grayscale lithography," Microelectronic Engineering, 84/12, pp.2859-2864, 2007
• Kasi Anbumony and S.-Y. Lee, "True Three-dimensional proximity effect correction in electron-beam lithography," J. Vac. Sci. Tehncol., B 24 (6), pp.3115-3120, Nov/Dec 2006
• S.-Y. Lee and Kasi Anbumony, "Analysis of Three-Dimensional Proximity Effect in Electron-Beam Lithography," Microelectronic Engineering, 83/2, pp.336-344, 2005
• S.-Y. Lee, F. Hu and J. Ji, "Representation of nonrectangular features for exposure estimation and proximity effect correction in electron-beam lithography," J. Vac. Sci. Technol., B22(6), pp.2929-2935, Nov/Dec 2004
• F. Hu and S.-Y. Lee, "Dose control for fabrication of grayscale structures using a single-step electron-beam lithographic process," J. Vac. Sci. Technol., B21(6), pp.2672-2679, Nov/Dec 2003