Application to Electron-beam Lithography (see PYRAMID Project):

E-beam Proximity Effect Correction

Dose Control for Fabrication Nanoscale 3-D Structures

Resist Profile Estimation and Control

Estimation and Minimization of LER (Line Edge Roughness)

Modeling SEM (Scanning Electron Microscope) Images

Parallel Image Processing (see Parallel & Distributed Computing):

Convolution

CT Image Reconstruction

Proximity Effect Correction